Enhanced X-ray Emissions Arising from High Pulse Repetition Frequency Ultrashort Pulse Laser Materials Processing

The ongoing trend in the development of powerful ultrashort pulse lasers has attracted increasing attention for this technology to be applied in large-scale surface engineering and modern microfabrication. However, the emission of undesired X-ray photon radiation was recently reported even for industrially relevant laser irradiation regimes, causing serious health risks for laser operators. In the meantime, more than twenty influencing factors have been identified with substantial effects on X-ray photon emission released by ultrashort pulse laser processes. The presented study on enhanced X-ray emission arising from high pulse repetition frequency ultrashort pulse laser processing provides new insights into the interrelation of the highest-contributing parameters. It is verified by the example of AISI 304 substrates that X-ray photon emission can considerably exceed the legal dose rate limit when ultrashort laser pulses with peak intensities below 1 × 1013 W/cm² irradiate at a 0.5 MHz pulse repetition frequency. The peak intensity threshold value for X-ray emissions decreases with larger laser spot sizes and longer pulse durations. Another key finding of this study is that the suction flow conditions in the laser processing area can affect the released X-ray emission dose rate. The presented results support the development of effective X-ray protection strategies for safe and risk-free ultrashort pulse laser operation in industrial and academic research applications.

VIVO@HSMW